Electron beam gun / for surface analysis applications 100 – 3 000 eV | EG3000 电子束枪/表面分析中的应用100 – 3 000 eV | eg3000
Characteristics
特点
Options:
选项：
for surface analysis applications
表面分析应用
Description
描述
Performance Features
性能特点
operation from 100-3000eV
从100-3000ev操作
compatible with AES, charge neutralization and other surface analysis applications
兼容AES，电荷中和等表面分析中的应用
auto focus mode for small spot applications
小型现场应用自动对焦模式
defocus mode for broad beam applications
宽束散焦模式的应用
fully UHV compatible and bakeable
完全兼容，为特高压
integral magnetic shielding
整体磁屏蔽
The LK Technologies Model EG3000 Electron Gun with matching control electronics is suitable for a variety of surface analysis applications such as Auger electron spectroscopy, electron scattering and diffraction experiments, and charge neutralization. The electron beam energy can be continuously varied from 0.1-3 keV. The beam current is adjustable from 10 nA to greater than 100 µA. With the standard refractory metal cathode, the gun provides a minimum spot size of approximately 1mm at a working distance of 75mm.
LK技术模型eg3000电子枪匹配电子控制适用于各种表面分析等应用俄歇电子能谱、电子散射和衍射实验，和电荷中和。电子束的能量可连续变化的0.1-3 keV。电子束电流可从10钠大于100µA.与标准的难熔金属阴极，枪在工作距离75mm提供最小约1mm光斑尺寸。
The control electronics features an “autofocus” mode which maintains minimum spot size focus with beam energy variation as well as a “defocus” mode which allows operator adjustment to uniformly defocus electron beams up to 10mm in diameter (or greater, depending on working distance). The electron gun is fully UHV compatible, employs integral magnetic shielding and can be baked to 200°C. All electron guns are tested under UHV conditions prior to shipment. For special applications involving smaller spot sizes, cathode variations or other custom requirements, please consult LK Technologies.
电子控制功能的“自动对焦”模式，保持最小光斑尺寸的焦点光束能量的变化以及“散焦”模式，允许操作员调整均匀散焦电子束直径达10mm（或更多，取决于工作距离）。电子枪是完全的超高压兼容，采用整体磁屏蔽，可以在高压条件下测试了所有的电子枪在高压条件下装运前200。对于涉及较小的光斑尺寸的特殊应用，阴极变化或其他定制要求，请咨询路技术。
Electron beam gun / for surface analysis applications 100 – 3 000 eV | EG3000 电子束枪/表面分析中的应用100 – 3 000 eV | eg3000
