电子束蒸发器EBV 40A1设计用于超纯亚单层和多层MBE薄膜生长。
精确定义的蒸发束意味着在样品上高度均匀的沉积，沉积面积由电子束蒸发器到样品的距离和一个容易更换的出口孔的选择决定。电子束蒸发器EBV 40A1配置有手动或自动快门选择。定制插入长度190–345毫米(根据要求提供其他长度)。
特征
- 手动或电动气动快门，集成流量监视器
- 钨丝，用于从棒状材料或小的导电坩埚中蒸发
- 多种可更换出口孔
- 整体水冷
- 适用于各种材料
- 独特的高可靠性设计
- 极高的功率密度
- 极高的功率密度
| Mounting flange | DN 40CF (rotatable) |
| Temperature range (for evaporated materials) | 160 °C – 2300 °C (3300 °C for molybdenum connector) |
| Filament current | typically 1.8 – 2.2 A, max 2.3 A |
| Evaporating rod diameter | 2 mm standard (other on request), step 2 mm, wire feed 25 mm wire length 43 mm |
| Water cooling (required) | water flow: > 0.5 l/min., temperature: 20-30 °C, max pressure: 6 bar |
| Exit aperture diameters | set 1: ID 4, ID 6, ID 7.4 (standard) set 2: ID 10, ID 14, ID 19 |
| Type of shutter | manual or pneumatic |
| Power | – 50 W for high vapor pressure materials – up to 200 W for crucibles and thick wires |
| Energy range | 1 – 1500 eV |
| Cathode type | thoriated tungsten |
| Crucible type (option) | Knudsen cell type made from: Mo, W, liner PBN, Al2O3 |
| Crucibles volume | 0.07 ml |
| Evaporated materials | all typical materials according to crucible type |
| 其他人 | – flux regulation via ion current incl. electrode, feedthrough, display unit and PID-regulator – rear-loading evaporant |
| Insertion length | min. 190 mm (other on request) OD: 34.8 mm |
| Deposition area | dependent on working distance (e.g. 6 mm for distance 25 mm – ID 4, 33 mm for distance 75 mm – ID 19) |
| Working distance | 25 – 75 mm (optimum) |
| Bakeout temperature | up to 250°C |
| Working pressure | <10-5 mbar |
