NonSequitur 离子源离子枪 Ion Guns: Model 1401 5eV – 5keV 气相离子源

Nonsequitur公司的Model 1401离子源离子枪非常适合用于表面化学实验,例如使用Auger 和ESCA进行样品制备和深度分析,可以用于惰性气体。

在工作距离为25mm,束流大小为20µA时,光斑为直径0.4mm。相比较于其他的离子枪而言,离子枪Model 1401能提供的电流密度是其他离子枪的1-倍。当束流为1µA时,光斑最小可以选择到50µm. 电子束能量可以在范围5eV到5keV中选择,并同时保持样品的最佳聚焦。束流大小可以调节,并不受电子束能量的影响,无需外部设备,可以直接从前面板进行调节。

通过电子冲击来生成离子,双灯丝设计可以延长使用寿命,而无需中断设备的使用。离子源的真空灯丝处于离轴状态,以防止灯丝材料沉积到样品上。
The ion source may be differentially pumped either directly into the system or by means of a separate turbo pump for improved system vacuum.

The controller with power supplies and scan electronics is housed in a single 5-1/4″ high 19″ rack mount cabinet. The Ion Gun can be controlled either from the front panel or through a flexible interface allowing control of beam and focus voltages, ionization current, gas, beam on/off, and raster. The raster scan is digitally generated for uniform etch rate.

Design Features:

  • High current density 15 to 50 mA/cm2 depending on spot size selected.
  • Unique ion source design for stable emission.
  • Dual tungsten filaments with typical filament life-time > 500 hours. Yttria coated iridium optional.
  • Replaceable beam trimming aperture with typical life-time > 500 hours.
  • All UHV compatible and etch resistant materials used in fabrication.
  • Differential pumping tominimize main chamber gas loading.
  • Gun is easily disassembled for maintenance.
  • Electrical connections and gas inlet located on a single flange for easier installation.
  • Preset extraction and condenser lens parameters (three spot size settings) for repeatable operation.
  • Integral beam current measurement.
  • Direct measurement of ion source pressure.
  • System and cable interlocks prevent energizing high voltage with poor vacuum or cable removed.
  • Power supply and raster generator in single 5-1/4 high 19 inch rack mount enclosure.
  • Digitally generated raster option for uniform etch profile.
  • Computer control option.
  • Optional ion source pressure regulation.

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