20kev 二次离子质谱SIMS聚焦离子源 表面分析仪器样品清洁离子枪离子源Model 1420

Nonsequitur 离子枪离子源Model 1420 Design Features

  • Adjustable spot size ≥ 5um for spatially defined sputtering or implantation
  • Emission regulated bombardment provides stable ion current
  • Continuously variable beam energy 5kV to 20kV
  • Dual octupole for beam scanning and astigmatism correction
  • Pre-objective scanning for reduced spot size
  • No direct filament to sample line of sight to avoid sample contamination
  • Customer replaceable filaments and beam trimming apertures
  • Dual filaments provide operational backup in case of filament end of life
  • All UHV compatible and etch resistant materials used in fabrication
  • Differential pumping to minimize main chamber gas load
  • Operates over the range of inert gases and Nitrogen
  • 可调点大小≥ 5um,用于空间定义的溅射或植入
    排放调节轰炸提供稳定的离子电流
    连续可变光束能量 5kV 至 20kV
    用于光束扫描和散光校正的双八角形
    目标前扫描,以减少点大小
    没有直接灯丝到样品视线,以避免样品污染
    客户可更换灯丝和光束修剪孔径
    双丝在灯丝寿命结束时提供操作备份
    制造中使用的所有超高压兼容和蚀刻耐药材料
    差分泵送,以尽量减少主室气体负荷
    在惰性气体和氮气范围内工作

Nonsequitur 离子枪离子源Model 1420 选配

  • Thoria coated Iridium filaments for operation with Oxygen
  • Variable aperture for spot size down to 1um
  • Blanking plates for fast beam pulsing
  • Alkali metal source for operation with Cs, Li, Na, K etc
  • Source oven to permit production of ions of evaporable materials
  • Source with integral Wien filter
  • 托里亚涂层虹膜丝与氧气操作
    可变光圈的斑点大小下降到1um
    用于快速光束脉动的空白板
    碱金属源与 Cs、Li、Na、K 等一起运行
    源烤箱,允许生产离子的可蒸发材料
    具有积分维恩过滤器的源

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