Nonsequitur 离子枪离子源Model 1420 Design Features
- Adjustable spot size ≥ 5um for spatially defined sputtering or implantation
- Emission regulated bombardment provides stable ion current
- Continuously variable beam energy 5kV to 20kV
- Dual octupole for beam scanning and astigmatism correction
- Pre-objective scanning for reduced spot size
- No direct filament to sample line of sight to avoid sample contamination
- Customer replaceable filaments and beam trimming apertures
- Dual filaments provide operational backup in case of filament end of life
- All UHV compatible and etch resistant materials used in fabrication
- Differential pumping to minimize main chamber gas load
- Operates over the range of inert gases and Nitrogen
- 可调点大小≥ 5um,用于空间定义的溅射或植入
排放调节轰炸提供稳定的离子电流
连续可变光束能量 5kV 至 20kV
用于光束扫描和散光校正的双八角形
目标前扫描,以减少点大小
没有直接灯丝到样品视线,以避免样品污染
客户可更换灯丝和光束修剪孔径
双丝在灯丝寿命结束时提供操作备份
制造中使用的所有超高压兼容和蚀刻耐药材料
差分泵送,以尽量减少主室气体负荷
在惰性气体和氮气范围内工作
Nonsequitur 离子枪离子源Model 1420 选配
- Thoria coated Iridium filaments for operation with Oxygen
- Variable aperture for spot size down to 1um
- Blanking plates for fast beam pulsing
- Alkali metal source for operation with Cs, Li, Na, K etc
- Source oven to permit production of ions of evaporable materials
- Source with integral Wien filter
- 托里亚涂层虹膜丝与氧气操作
可变光圈的斑点大小下降到1um
用于快速光束脉动的空白板
碱金属源与 Cs、Li、Na、K 等一起运行
源烤箱,允许生产离子的可蒸发材料
具有积分维恩过滤器的源