LK2000 HREELS instrument LK technologies
The LK2000 HREELS instrument has seen widespread use in industrial and academic laboratories worldwide. It has been successfully applied to a diverse range of problems, including hydrocarbon chemisorption (catalysis) on metals, analysis of silicon wafer cleaning techniques, surface plasmons, characterization of polymer films, C60 film studies, and innumerable others.
- Resolution at 3 meV (FWHM) and below
- Rotatable and Fixed Optics Models
- Integral Dual Magnetic Shielding for Simple “Bolt-On” Installation
LK2000 HREELS 仪器已在全球工业和学术实验室得到广泛应用。它已成功应用于各种问题，包括金属的碳氢化合物化学（催化）、硅晶片清洁技术分析、表面质粒、聚合物薄膜的表征、C60薄膜研究，以及无数别的应用。
分辨率在 3 meV （FWHM） 及以下
可旋转和固定光学型号
集成双磁性屏蔽，用于简单的”螺栓打开”安装
