High Voltage 负溅射离子源 Model 860A and 860C 主要特点
易于操作和维护
可以提供周期表中几乎所有元素的高强度离子束
束流高达150 µA
近光灯发射
易于装载储液罐
铯电荷寿命 > 1000 hours
易于更换来源材料
General description
The HVE Model 860 Negative Sputter Ion Source is a heavy ion source which produces microampere intensity negative ion beams from a wide variety of elemental materials.
The negative ions are produced by bombarding a cylindrical target of the desired beam material with positive cesium ions. Particles of target material are sputtered from the surface of the target by the cesium ions, and produce low velocity atoms which charge exchange in the neutral cesium surface layer. These secondary negative ions are repelled from the surface of the target and are accelerated to ground potential, acquiring a beam energy of about 10 – 40 keV depending on the extraction voltage. A pair of permanent magnets, installed in the source housing suppresses secondary electrons. To change ion species, the existing cathode target can be easily and quickly replaced by a
new one through an in-line gate valve without breaking the vacuum.
Two types of the Model 860 Sputter Ion Source are available:
– The Model 860A, with an annular ionizer capable of producing high intensity negative ion beams over longer periods of time
– The Model 860C, with a spherical ionizer especially recommended when beams with small emittance are required for efficient transmission at low acceleration voltages or through large accelerator systems Modification kits to change a Model 860A source into a Model 860C source are available.
