丹麦tantec公司介绍
我们有超过40年的历史,任何行业的高端表面处理产品的制造经验。Tantec不断为苛刻的实验要求开发新的解决方案。
Tantec集团是一家私人控股公司,成立于1974年,是一家主要为塑料和金属表面提高附着力而生产标准和定制的等离子体和电晕系统的公司。Tantec表面处理系统拥有全世界最多的客户超过30个全球合作伙伴.
Tantec / S是总部位于丹麦的Lunderskov,purpose-build工厂从1989年开始,服务,研发专用机械和高质量的电子表面处理设备。
Tantec EST inc .)是北美分公司,成立于1987年,在芝加哥。
Wimsheim Tantec GmbH,在汉堡,以及生产设备销售和服务办事处,1995年在德国成立。
产品介绍:
标准和定制的真空等离子处理系统,vacu line是专为处理各种不同的注塑零件,这台机器是为在线生产设计的,不需要人工操作,具有非常快速的处理时间和为下游涂料、黏合、绘画、印刷提供最佳的表面附着力优化。
Easy to install and use | Connects to main power and compressed air. |
Fast treatment times | High power impact enables treatment times from 20-180 seconds depending on materials. |
Standard or customised chambers | Chamber size can be designed to most applications. |
Process gas | Process gasses such as oxygen and argon can be used, but in most cases it is not necessary. |
Process control | Entire plasma process is controlled by the HV-X generator and PLC unit. All parameters are displayed on the touch panel. (Standard – Proface). |
Cost efficient surface treatment | Due to the low power and no need of special treatment gasses, the unit is a very cost efficient solution for improving surface wettability and adhesion. |
Vacuum pressure plasma | Enables treatment of both conductive and non-conductive surfaces. |
Works in fully automated lines | Integrates easily into robot cells or existing transportation lines. |
Technical Specifications | VacuLINE |
Mains voltage and frequency | 3 x 400 VAC + 0 |
Plasma power | 0 – 6000 Watt |
Power supply | HV-X plasma generator series |
Compressed air inlet | 5-6 bar dry and clean |
Process gas | Standard: air. On request: Oxygen, argon and nitrogen |
Vacuum pump capacity in m3/min. | 15 to 240 m3/min., depending on size of vacuum chamber |
Vacuum level | 1-4 mbar |
Evacuation time, typical | 15-60 seconds, depending on chamber size and pump capacity |
Plasma treatment time, typical | 20-180 seconds, depending on material |
Control and connectivity | Complete with touch panel. (Standard – Proface) |
Regulation compliance | CE – RoHs – WEEE |