磁控源，用于在溅射过程中施加具有高均匀性的薄层。适用于直径为2英寸的目标。
根据溅射工艺所需的条件，我们提供两种类型的源：B型和C型。
所有类型都与我们的M600DC-PS电源以及市场上所有其他直流、射频和脉冲直流电源完全兼容。
特性
有或没有原位倾斜模块
安装法兰范围
烟囱为标准配置
气动圆顶式或侧摆式百叶窗
间接冷却
选项
A型磁控源用于在溅射过程中施加具有高均匀性的薄层。该电源与特高压条件兼容。得益于集成的原位倾斜系统，它既可用于标准腔体，也可用于定制腔体。通过使用圆顶型设计，我们最大限度地减少了打开百叶窗所需的空间。
| Mounting flange | DN 63 CF, DN 100 ISO-K* |
| Max. power (DC mode) | 400 W DC ** |
| Max. power (RF mode) | 400 W RF ** |
| Max. voltage DC | 1200 V |
| Connector DC/RF | type 7/16 |
| Target | |
| form | circular |
| diameter | 2″ (50.8 mm) ± 0.2 mm |
| thickness | 1 – 6 mm |
| cooling | indirect |
| Water flow | min. 1 l/min |
| Max. inlet water temperature | < 28 °C |
| Max. water pressure | 3 bar |
| Tubing diameter | Ø6×1 mm PTFE |
| Magnet material | Neodymium Iron Boride (NdFeB) |
| Magnet max. temperature | 200°C |
| Internal pneumatic shutter | yes |
| Shutter type | dome type or flat swing |
| Insitu tilt module | yes, range +45° ÷ -10° |
| Chimney | yes |
| Dedicated materials: | |
| typical rates [nm/min] for 200 W: | |
| Cu | 40,87 nm/min ( distance: 150 mm; target thickness: 3 mm)*** |
| Ti | 10,82 nm/min (distance: 150 mm; target thickness: 3 mm)*** |
| Fe | 15,94 nm/min (distance: 150 mm; target thickness: 1 mm)*** |
| Internal gas inlet | yes (VCR standard) |
| Working gas | Ar |
| Max. working pressure | 5×10-3 – 1×10-1 mbar |
| Optimal working pressure | 5×10-3 – 5×10-2 mbar |
B型磁控源用于在溅射过程中施加具有高均匀性的薄层。该电源与特高压条件兼容。该源专为溅射磁性和铁磁性材料而设计。它可以操作高达7毫米厚的目标。
| Mounting flange | DN 63 CF |
| Max. power (DC mode) | 400 W DC ** |
| Max. power (RF mode) | 400 W RF ** |
| Max. voltage DC | 1200 V |
| Connector DC/RF | type 7/16 |
| Target | |
| form | ring |
| diameter | 2″ (50.8 mm) ± 0.2 mm |
| thickness | 1 – 7 mm (magnetic & non-magnetic) |
| cooling | indirect |
| Water flow | min. 1 l/min |
| Max. inlet water temperature | < 28 °C |
| Max. water pressure | 3 bar |
| Tubing diameter | Ø6×1 mm PTFE |
| Magnet material | Samarium Cobalt (SmCo) |
| Magnet max. temperature | 350°C |
| Internal pneumatic shutter | yes |
| Shutter type | dome type or flat swing |
| Insitu tilt module | yes, range +45° ÷ -10° |
| Chimney | yes |
| Dedicated materials: | |
| typical rates [nm/min] for 200 W: | |
| Cu | 32,84 nm/min ( distance: 160 mm; target thickness: 3 mm)*** |
| Ti | 10,07 nm/min (distance: 160 mm; target thickness: 3 mm)*** |
| Fe | 9,63 nm/min (distance: 160 mm; target thickness: 3 mm)*** |
| Internal gas inlet | yes (VCR standard) |
| Working gas | Ar |
| Max. working pressure | 5×10-3 – 1×10-1 mbar |
| Optimal working pressure | 5×10-3 – 5×10-2 mbar |
* Other mounting flanges on request
** The maximum power is determined by the target material
*** Distances depend on the geometry of the chamber and the magnetrons
