磁控源，用于在溅射过程中施加具有高均匀性的薄层。适用于直径为3英寸的目标。
根据溅射工艺所需的条件，我们提供两种类型的源：B型和C型。
所有类型都与我们的M600DC-PS电源以及市场上所有其他直流、射频和脉冲直流电源完全兼容。
特性
有或没有原位倾斜模块
安装法兰范围
烟囱为标准配置
气动圆顶式或侧摆式百叶窗
间接冷却
选项
质量流量控制器（MKS MF1）
定制长度
Z机械手
B型磁控源用于在溅射过程中施加具有高均匀性的薄层。该电源与特高压条件兼容。磁控源专为溅射磁性和铁磁性材料而设计。它可以对厚度达7毫米的目标进行操作。
| Mounting flange | DN 160 CF* |
| Max. power (DC mode) | 600 W DC ** |
| Max. power (RF mode) | 600 W RF ** |
| Max. voltage DC | 1200 V |
| Connector DC/RF | type 7/16 |
| Target | |
| form | ring |
| diameter | 3″ (76.2 mm) ± 0.2 mm |
| thickness | 1 – 7 mm (magnetic & non-magnetic) |
| cooling | indirect |
| Water flow | min. 1 l/min |
| Max. inlet water temperature | < 28 °C |
| Max. water pressure | 3 bar |
| Tubing diameter | Ø6×1 mm PTFE |
| Magnet material | Samarium Cobalt (SmCo) |
| Magnet max. temperature | 350°C |
| Internal pneumatic shutter | yes |
| Shutter type | dome type or flat swing |
| Insitu tilt module | yes, range +45° ÷ -10° |
| Chimney | yes |
| Dedicated materials: | |
| typical rates [nm/min] for 200 W: | |
| Cu | 18,72 nm/min (distance: 170 mm; target thickness: 3 mm)*** |
| Ti | 4,10 nm/min (distance: 170 mm; target thickness: 3 mm)*** |
| Fe | 5,16 nm/min ( distance: 170 mm; target thickness: 3 mm)*** |
| Internal gas inlet | yes (VCR standard) |
| Working gas | Ar |
| Max. working pressure | 5×10-3 – 1×10-1 mbar |
| Optimal working pressure | 5×10-3 – 5×10-2 mbar |
C型磁控溅射源既兼容射频，也兼容直流，可以沉积多种材料：导体、半导体和绝缘体。磁控管源能够产生均匀、均质和小晶粒的薄膜；具有高密度（低空隙面积）、高镜面性（反射率）、无辐射损伤和粘合断裂等优点。
| Mounting flange | DN 160 CF* |
| Max. power (DC mode) | 600 W DC ** |
| Max. power (RF mode) | 600 W RF ** |
| Max. voltage DC | 1200 V |
| Connector DC/RF | type 7/16 |
| Target | Keeper standard |
| form | circular |
| diameter | 3″ (76.2 mm) ± 0.2 mm |
| thickness | 1 – 6 mm |
| cooling | indirect |
| Water flow | min. 1 l/min |
| Max. inlet water temperature | < 28 °C |
| Max. water pressure | 3 bar |
| Tubing diameter | Ø6×1 mm PTFE |
| Magnet material | Neodymium Iron Boride (NdFeB) |
| Magnet max. temperature | 200 °C |
| Internal pneumatic shutter | yes |
| Shutter type | dome type or flat swing |
| Insitu tilt module | yes, range +45° ÷ -10° |
| Chimney | yes |
| Dedicated materials: | |
| typical rates [nm/min] for 200 W: | |
| Cu | 19,76 nm/min (distance: 150 mm; target thickness: 3 mm)*** |
| Ti | 4,08 nm/min (distance: 150 mm; target thickness: 6 mm)*** 4,32 nm/min (distance: 150 mm; target thickness: 3 mm)*** |
| Internal gas inlet | yes (VCR standard) |
| Working gas | Ar |
| Max. working pressure | 5×10-3 – 1×10-1 mbar |
| Optimal working pressure | 5×10-3 – 5×10-2 mbar |
* Other mounting flanges on request
** The maximum power is determined by the target material
*** Distances depend on the geometry of the chamber and the magnetrons
