电子束蒸发器EBV 40A1专为超纯亚单层和多层MBE薄膜生长而设计。
描述
精确定义的蒸发剂束意味着在样品上高度均匀的沉积，沉积面积由电子束蒸发器到样品的距离和易于更换的出口孔之一的选择决定。电子束蒸发器EBV 40A1配置有手动或自动快门的选择。自定义插入长度190-345毫米（根据要求提供其他长度）
特性
手动或电动气动快门，集成通量监测器
W/Th灯丝，用于从棒状材料或小型导电坩埚中蒸发
多种可更换的出口孔
整体水冷
适用于各种材料
独特的高可靠性设计
极高的功率密度
极高的功率密度
选项
定制插入长度
有或没有集成手动/电动气动快门
线性移位
坩埚
技术参数
| Mounting flange | DN 40CF (rotatable) |
| Temperature range (for evaporated materials) | 160 °C – 2300 °C (3300 °C for molybdenum connector) |
| Filament current | typically 1.8 – 2.2 A, max 2.3 A |
| Evaporating rod diameter | 2 mm standard (other on request), step 2 mm, wire feed 25 mm wire length 43 mm |
| Water cooling (required) | water flow: > 0.5 l/min., temperature: 20-30 °C, max pressure: 6 bar |
| Exit aperture diameters | set 1: ID 4, ID 6, ID 7.4 (standard) set 2: ID 10, ID 14, ID 19 |
| Type of shutter | manual or pneumatic |
| Power | – 50 W for high vapor pressure materials – up to 200 W for crucibles and thick wires |
| Energy range | 1 – 1500 eV |
| Cathode type | thoriated tungsten |
| Crucible type (option) | Knudsen cell type made from: Mo, W, liner PBN, Al2O3 |
| Crucibles volume | 0.07 ml |
| Evaporated materials | all typical materials according to crucible type |
| Others | – flux regulation via ion current incl. electrode, feedthrough, display unit and PID-regulator – rear-loading evaporant |
| Insertion length | min. 190 mm (other on request) OD: 34.8 mm |
| Deposition area | dependent on working distance (e.g. 6 mm for distance 25 mm – ID 4, 33 mm for distance 75 mm – ID 19) |
| Working distance | 25 – 75 mm (optimum) |
| Bakeout temperature | up to 250°C |
| Working pressure | <10-5 mbar |
