Nanoscribe 3D光刻系统
Nanoscribe GmbH Laser lithography system 1 Nanoscribe GmbH Photonic Professional Option GT 1.01 Nanoscribe GmbH fs-fiber laser 1.02 Nanoscribe GmbH Motorized scanning stage with writing field 1.03 Nanoscribe GmbH High-sensitivity microscope camera; 1.04 Nanoscribe GmbH Active self-leveling isolation frame 1.05 Nanoscribe GmbH Immersion objective; 1.06 Nanoscribe GmbH Immersion objective 1.07 Nanoscribe GmbH Air objective; 1.08 Nanoscribe GmbH Sample holder 1.09 Nanoscribe GmbH Stainless steel working desk 1.10 Nanoscribe GmbH Sample holder Multi DiLL 2.01 Nanoscribe GmbH Sample holder: 2.02 Nanoscribe GmbH Sample holder: 2.03 Nanoscribe GmbH Sample holder: 2.04 Nanoscribe GmbH Sample holder: 2.05 Nanoscribe GmbH IP-L 780 photoresist 3.01 Nanoscribe GmbH IP-Dip photoresist 3.02 Nanoscribe GmbH IP-S photoresist; 3.03 Nanoscribe GmbH DiLL glass substrates 3.04 Nanoscribe GmbH DiLL glass substrates 3.05 Nanoscribe GmbH Immersion objective felt ring 3.06 Nanoscribe GmbH Immersion objective felt ring 3.07 Nanoscribe GmbH Guarantee extension MM13 – MM24 4.01 Nanoscribe GmbH Photonic Professional GT2 0