Idonus Sarl Modular alignment system for shadow mask or other mask to substrate alignment [P1801-07-00] MAS150 掩膜对准系统（不带显微镜）
Modular alignment system for shadow mask or other mask to
substrate alignment
* size: up to 150mm
* standard model for alignment precision of typically 3 - 5 um
(others on request)
* base unit with 3 linear axis and 1 rotation axis and 2 tilt axis
for tilt (wedge) error compensation
substrate alignment
* size: up to 150mm
* standard model for alignment precision of typically 3 - 5 um
(others on request)
* base unit with 3 linear axis and 1 rotation axis and 2 tilt axis
for tilt (wedge) error compensation
Mechanical clamping ring 200mm waferHydrofluoric acid vapor phase etcher wafer size
200mm / 8''Hydrofluoric acid vapor phase etcher wafer size
200mm / 8''
询价采购Idonus Sarl Modular alignment system for shadow mask or other mask to substrate alignment [P1801-07-00] MAS150 掩膜对准系统（不带显微镜）
请用微信扫描下方二维码或手动添加微信号2351992198
