ALLRESIST GmbH AR-P 3170 Photoresist 30ml 光刻胶
Mask making, optical applications
Properties / Resist：AR-P 3170
Solids content：7%
Viscosity (25 °C)：2mPa×s
Film thickness at 4000 rpm（Semitec CPS 20, uncovered chuck, 2“ Si-wafer）：120nm
Film thickness at 6000 - 2000 rpm：100 - 170nm
Flash point：42°C
Filtration：0.2μm
Storage at temperatures：10 - 18°C
ALLRESIST GmbH AR-P 3170 Photoresist 30ml 光刻胶
询价采购ALLRESIST GmbH AR-P 3170 Photoresist 30ml 光刻胶
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