
PVA TEPLA IoN 40-Plasma Processing System 等离子清洗机
System Features:
► Aluminum process chamber, 9” (22.cm) High X13” (33 cm) Wide X 19” ID (48.3 cm) Deep, 36.5 liters, chamber volume
► Chamber view-port
► High-Conductance Vacuum Port and Isolation Valve
► 600 Watt Air Cooled 13.56 MHz RF Power Supply
► Two Std. Mass Flow Controllers (MFC), 500scc/m
► Standard Gas Line connections – (301091)
► Inert Gas Backfill Capability
► Industrial Grade Control Computer
• Liquid Crystal Color Touch-Screen (Graphical User Interface)
• Selectable Language User Interface (English, French, German, Chinese)
• Intel Processor, Windows ® OS
• 160 GB Hard Disk
•1 GB RAM
• USB
► Control Software
• Storage of an Unlimited Number Recipes
• Up to 64 Process Steps
• Multiple Step Terminators
• Integrated Software Safeties
• All Components Fail Safe
• Multi-level Password Protection
• On-Screen Graphical Display of all Process Variables
• Data Collection to Hard Disk
• Display of Set Point and Actual of all Process Variables
• Validated, CFR Title 21 Part 11 compliant
► Pre-installed Sample Plasma Recipe
► Ethernet / Networking Capable TCP/IP
► Vacuum Measurement – Thermocouple Gauge
► Electrode Assembly (5-Shelf, Glass Slide )
► 220V / 50HZ System Operation
► Level 1 Spares Kit 230V(P/N 301078)
► BOC EDWARDS E2M28FX Pump
PVA TEPLA IoN 40-Plasma Processing System 等离子清洗机
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